Atmospheric Pressure vs. Low Pressure Chemical Vapor Deposition
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- Publication date
- 1991-05
- Publisher
- Palo Alto, California: Watkins-Johnson Company
- Collection
- watkinsjohnsontechnotes; americana
- Contributor
- Terry O'Laughlin
- Language
- English
- Volume
- 18
- Item Size
- 65.7M
- Addeddate
- 2021-05-08 02:47:21
- Camera
- Sony Alpha-A6300 (Control)
- Foldoutcount
- 0
- Identifier
- wjtechnotesv18n3
- Identifier-ark
- ark:/13960/t45r5tq3q
- Invoice
- 2044
- Issn
- 1048-5651
- Issue
- 3
- Oclc
- 21074553
- Ocr
- tesseract 5.0.0-alpha-20201231-10-g1236
- Ocr_detected_lang
- en
- Ocr_detected_lang_conf
- 1.0000
- Ocr_detected_script
- Latin
- Ocr_detected_script_conf
- 1.0000
- Ocr_module_version
- 0.0.13
- Ocr_parameters
- -l eng
- Page-progression
- lr
- Page_number_confidence
- 93.75
- Pages
- 18
- Pdf_module_version
- 0.0.13
- Physical_item
- 102
- Ppi
- 500
- Republisher_date
- 20210507141923
- Republisher_operator
- associate-eliza-zhang@archive.org
- Republisher_time
- 117
- Scandate
- 20210506001038
- Scanner
- scribe1.sanfrancisco.archive.org
- Scanningcenter
- sanfrancisco
- Tts_version
- 4.4-initial-129-g57db8e10
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